Fabrication and Characterization of Thin Film Bridge Resistor

Abstract

Bridge-wire electric detonators are prone to malfunctioning under very high gravitational and rotational and impact forces due to breakage of resistive wire soldered between the electrodes. Globally, the resistive bridge-wire technology of electric detonators is being replaced with alternate and reliable systems. Thin film bridge resistors are known to be more rugged and reliable than bridge-wire technology. This study is aimed at exploring and fabricating thin film bridge resistor to be used in electric detonator to enhance their reliability and performance. Nickel Chromium alloy with 80/20 composition, Gold and Silver have been used individually for manufacturing of thin film resistors. Fabrication of thin films has been carried out through different Physical Vapor Deposition techniques on glass and Bakelite substrates. Scanning Electron Microscopy, X-Ray Diffraction and Atomic Force Microscopy has been carried out for characterization of thin films The electrical resistance of thin films has been determined using Two Probe Method.. A comparison of characterization and resistances of all films has been made with existing literature and also with each other to identify most suitable material for fabrication of thin film bridge resistor for electric detonators.