NUST Institutional Repository

Silicon Technologies : Ion Implantation and Thermal Treatment /

Show simple item record

dc.contributor.author [Ed.] Baudrant, Annie
dc.date.accessioned 2025-02-11T05:29:42Z
dc.date.available 2025-02-11T05:29:42Z
dc.date.issued 2011
dc.identifier.isbn 978-1-84821-231-2
dc.identifier.uri http://10.250.8.41:8080/xmlui/handle/123456789/49671
dc.language.iso en_US en_US
dc.publisher Wiley; ISTE Ltd. en_US
dc.subject Semiconductor doping en_US
dc.subject Ion implantation en_US
dc.subject Semiconductors--Heat treatment en_US
dc.title Silicon Technologies : Ion Implantation and Thermal Treatment / en_US
dc.type Book en_US


Files in this item

This item appears in the following Collection(s)

Show simple item record

Search DSpace


Advanced Search

Browse

My Account