dc.contributor.author | [Ed.] Baudrant, Annie | |
dc.date.accessioned | 2025-02-11T05:29:42Z | |
dc.date.available | 2025-02-11T05:29:42Z | |
dc.date.issued | 2011 | |
dc.identifier.isbn | 978-1-84821-231-2 | |
dc.identifier.uri | http://10.250.8.41:8080/xmlui/handle/123456789/49671 | |
dc.language.iso | en_US | en_US |
dc.publisher | Wiley; ISTE Ltd. | en_US |
dc.subject | Semiconductor doping | en_US |
dc.subject | Ion implantation | en_US |
dc.subject | Semiconductors--Heat treatment | en_US |
dc.title | Silicon Technologies : Ion Implantation and Thermal Treatment / | en_US |
dc.type | Book | en_US |