NUST Institutional Repository

Effect of Processing Parameters on Boron Doped Silica Preform Rods Fabricated Using Modified Chemical Vapor Deposition (MCVD) Process Through Study of its Coefficient of Thermal Expansion (CTE) and Refractive Index (RI) Changes

Files in this item

This item appears in the following Collection(s)

  • MS [364]

Search DSpace


Advanced Search

Browse

My Account